What is Global Dry Etching Equipment Market?
The Global Dry Etching Equipment Market is a vast and dynamic sector that plays a crucial role in the world of technology. Dry etching equipment is used in the process of removing layers from the surface of a material by bombarding it with ions or by chemical reaction. This process is essential in the manufacturing of semiconductors, microelectromechanical systems (MEMS), and other microfabrication products. The global market for this equipment is substantial and continues to grow as the demand for these products increases. In 2022, the market was valued at a whopping US$ 10280 million and is expected to reach US$ 15950 million by 2029. This represents a compound annual growth rate (CAGR) of 6.4% during the forecast period of 2023-2029.
Inductively Coupled Plasma (ICP), Capacitive Coupled Plasma (CCP), Reactive Ion Etching (RIE), Deep Reactive Ion Etching (DRIE), Others in the Global Dry Etching Equipment Market:
The Global Dry Etching Equipment Market is dominated by a few key players, with the top three manufacturers accounting for 92.16% of the market in terms of sales value in 2019. These manufacturers have a significant influence on the market and its trends. However, the market is not limited to these players, and there is room for new entrants and smaller players to make their mark.
Logic and Memory, MEMS, Power Device, Others in the Global Dry Etching Equipment Market:
Geographically, the Asia-Pacific region (APAC) is the largest consumer of dry etching equipment, holding a massive 76.07% of the sales revenue market share in 2019. This can be attributed to the rapid industrialization and technological advancements in countries like China, Japan, and South Korea. North America follows APAC, with a 13% market share. The presence of key players and the adoption of advanced technologies contribute to the growth of the market in this region.
Global Dry Etching Equipment Market Outlook:
The Global Dry Etching Equipment Market is segmented based on the type of equipment and its applications. The types of equipment include Inductively Coupled Plasma (ICP), Capacitive Coupled Plasma (CCP), Reactive Ion Etching (RIE), Deep Reactive Ion Etching (DRIE), and others. Each type has its unique features and applications. For instance, ICP is used for high-density plasma processes, while CCP is used for low-density plasma processes. RIE is used for anisotropic etching, and DRIE is used for deep silicon etching.
| Report Metric | Details |
| Report Name | Dry Etching Equipment Market |
| Accounted market size in 2022 | US$ 10280 in million |
| Forecasted market size in 2029 | US$ 15950 million |
| CAGR | 6.4% |
| Base Year | 2022 |
| Forecasted years | 2023 - 2029 |
| Segment by Type |
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| Segment by Application |
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| Production by Region |
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| Consumption by Region |
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| By Company | Lam Research, TEL, Applied Materials, Hitachi High-Technologies, Oxford Instruments, ULVAC, SPTS Technologies, GigaLane, Plasma-Therm, SAMCO, AMEC, NAURA |
| Forecast units | USD million in value |
| Report coverage | Revenue and volume forecast, company share, competitive landscape, growth factors and trends |
